| instrument identity |
| model | EXPEC 6500D |
| manufacturer | Hangzhou EXPEC Technology Co., Ltd. |
| distribution / presentation | COLO.Science |
| instrument type | Inductively Coupled Plasma Optical Emission Spectrometer (ICP-OES) |
| intended use | Simultaneous qualitative, semi-quantitative and quantitative analysis of major, minor and trace inorganic elements for research, development and analytical testing laboratories. |
| work environment |
| power supply | 220 V AC +/- 10% |
| ambient temperature | 10-30 C |
| relative humidity | 20-80 %RH |
| RF plasma source |
| RF power range | 500-1600 W, dual power supplies, full digital control |
| RF generator | Self-excited RF generator with automatic tuning and water cooling, suitable for complex sample analysis and direct analysis of 100% methylbenzene samples |
| standby mode | iStandby mode at 500 W with argon consumption <=5 L/min and more than 50% reduction in standby argon use |
| plasma observation modes | Axial, radial, bi-directional and simultaneous bi-directional observation modes |
| intelligent attenuation | Axial and radial attenuation functions support analysis of samples within 100x concentration range without repeated dilution |
| RF frequency / coupling | 27.12 MHz; coupling efficiency >80% |
| RF stability | RF power stability <=0.1%; RF stability <=0.01% |
| optical system |
| optical chamber | Thermostatic 3D optical system, thermally isolated, argon-purged, maintained at 36 +/- 0.1 C |
| optical design | Fully fixed echelle optical-splitting system with no moving parts |
| wavelength range | 165-900 nm, full wavelength coverage |
| monochromator | 380 mm focal length with total reflection imaging optical path and quartz prism 2D dispersive system |
| echelle grating | 87 L/mm, 63.5 degrees blazing |
| wavelength correction | Automatic spectral position correction using C, N and Ar lines; no correction solution required |
| real-time calibration | Patented FSC full-spectrum real-time calibration using interference-free Ne characteristic spectral line |
| short wavelength handling | Argon optical purging for wavelengths below 189 nm; no vacuum pump required |
| stray light / resolution | Stray light <=2.0 mg/L at As 188.980 nm with 10,000 mg/L Ca solution; optical resolution (FWHM) <=7 pm @ 200 nm |
| detector |
| detector type | Special large-area array CCD / ECCD detector with pixel-level refrigeration |
| pixel matrix | 1024 x 1024 pixels in a single exposure |
| imaging size | 25.4 mm x 25.4 mm large-area imaging surface with 24 um x 24 um photosensitive units |
| cooling | Pixel-level TEC refrigeration acting directly on pixel elements to reduce condensation risk without gas purge protection |
| anti-overflow design | Back relief anti-saturation overflow protection for each pixel |
| signal acquisition | Intelligent integration with automatic exposure optimization for high- and low-intensity signals and wider dynamic range |
| analysis performance |
| analysis speed | About 200 spectral lines per minute |
| sample consumption | Only 2 mL |
| linear dynamic range | >=10^5 using Mn 257.6 nm; correlation coefficient >=0.999 |
| precision | RSD <=0.5% for repeated 10x determination of 1 ppm or 10 ppm multi-element mixed standard solutions |
| stability | RSD <=1% over 8 hours using 1 ppm or 10 ppm multi-element mixed standard solution |
| detection limits (ug/L) | Zn 213.856: 0.5; Ni 231.604: 1; Mn 257.610: 0.5; Cr 267.716: 1; Cu 324.754: 1; Ba 455.403: 0.1 |
| preheating time | Less than 5 minutes from standby to plasma ignition |
| topic | recommendation | note |
| high-salinity samples |
Use the optional argon on-line dilution setup when working with samples above 10% salinity. |
Helps simplify preprocessing and supports direct sample introduction. |
| high-content elements |
Leverage intelligent attenuation before repeated dilution when strong analyte concentration differences are expected. |
Designed to handle concentration variation within 100x range. |
| short wavelengths |
Use argon optical purging for wavelengths below 189 nm. |
No vacuum pump is required for this configuration. |
| routine stability |
Maintain room conditions within specified range and verify water-cooling readiness before operation. |
Instrument performance is specified at 10-30 C and 20-80 %RH. |
📄 source document: EXPEC 6500D manufacturer technical specification PDF
🧪 workflow focus: multi-element inorganic elemental analysis
🛠️ service readiness: remote diagnosis + field support model
🧾 procurement note: binding spec = quotation package